Global Photolithography Equipment Market Size, Trends, and Analysis - Forecasts to 2026 By Type (EUV, DUV, I-LINE, ArF, ArFi, KrF), By Type of Wavelength (370nm-270nm, 270nm-170nm,70nm-1nm), By Type of Light Source (Mercury Lamps, Fluorine Lasers, Excimer Lasers, Laser-Produced Plasma), By End-Users (IDMs, Foundries), By Region (North America, Europe, Asia Pacific, MEA, and CSA) and Competitive Landscape
Global Photolithography Equipment Market: Insights
Photolithography is a process of transferring a pattern using light, to a surface or substrate. Photolithography has seen wide acceptance and adaptation all over the world in the last few years. It has gained this high acceptance due to its ability to show precise performance in incisions. The key drivers of the Global Photolithography Equipment market are, the increasing demand for electronic miniaturized devices that deliver high outputs, advancements in semiconductor manufacturing industries, and the rising role of IoT in the market. Not just these but the increasing governmental support and monetary interventions have also contributed to the growth of this market.
Although the photolithography equipment may have served high maintenance and operational costs to the industries, the advancements in them still lure the industry demand resulting in the growth of this market. The COVID-19 pandemic surged the demand for photolithography equipment globally. The overall pandemic situation has increased the demand for high network connectivity and rising demand for semiconductors, leading to a projected upward trend in the global photolithography equipment market.
Global Photolithography Equipment Market: By Type
Based on the type of Photolithography equipment, the market is segmented into I-LINE, EUV, ArF, ArFi, KrF. EUV photolithography has been projected to grow at the fastest rate in this market. The increasing Artificial Intelligence (AI) interventions and developing technology is boosting up the demand for EUV in the market. Usage of EUV photolithography equipment reduces requisite redesigning of the core industrial processes.
Global Photolithography Equipment Market: By Wavelength
Based on the wavelength, the global photolithography market is divided into three segments, namely, 370nm-270nm, 270nm-170nm,70nm-1nm. 70nm-1nm segment of this market holds the largest share due to its ability to create cost-effective memory chips for semi-conductor industries. The 70nm-1nm wavelength is the latest and most advanced of all, supporting the EUV photolithography equipment mechanism.
Global Photolithography Equipment Market: Type of Light Source
Based on the wavelength or the source of light, the market holds four light sources, Fluorine Lasers, Mercury Lamps, Laser-Produced Plasma, Excimer Lasers. Laser-Produced Plasma holds the largest share in the market due to its increasing requirement in EUV photolithography equipment. This light source is extensively preferred by the EUV equipment due to its ability to generate wavelength high up to 1nm.
Global Photolithography Equipment Market: By End-Users
Based on the end-users, this market is segmented into IDMs and Foundries. IDMs account for the highest and largest share in this market. IDMs have advanced their semiconductor mechanisms by raising their investments in photolithography equipment. IDM firms emphasize R&D activities and enhancement of the technological applications using this equipment to boost the demand.
Global Photolithography Equipment Market: By Region
Based on the region, the market is segmented into Asia-Pacific, Europe, Middle East, and Africa, North America, and Central & South America. Asia-Pacific region holds a significant and largest position in the global Photolithography market. Countries of this region account to hold the highest number of Foundries compared to the rest of the world. APAC countries are also projected to show constant growth in the forecasted period. Increasing interest from within the end-users and companies, increasing support from governmental organizations, rising foreign investments, increased initiatives to incorporate advanced technology and Artificial Intelligence (AI) are driving the highest growth in the APAC region.
Global Photolithography Equipment Market: By Share & Competitor Analysis
ASML, Onto Innovations, Canon, NXQ, Nikon, SUSS Microtek, NuFlare Technology, Veeco Instrument, and EV Group among others, are the major vendors competing in the Global Photolithography Equipment market.
In November 2020, Taiwan Semiconductor Manufacturing Co. (TSMC) placed a huge order with ASML for the supply of EUV systems all over the world.
Please note: This is not an exhaustive list of companies profiled in the report.
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The Global Photolithography Equipment Market has been studied from the year 2019 till 2026. However, the CAGR provided in the report is from the year 2021 to 2026. The research methodology involved three stages: Desk research, Primary research, and Analysis & Output from the entire research process.
The desk research involved a robust background study which meant referring to paid and unpaid databases to understand the market dynamics; mapping contracts from press releases; identifying the key players in the market, studying their product portfolio, competition level, annual reports/SEC filings & investor presentations; and learning the demand and supply side analysis for the Photolithography Equipment Market.
The primary research activity included telephonic conversations with more than 50 tier 1 industry consultants, distributors, and end-use product manufacturers.
Finally, based on the above thorough research process, an in-depth analysis was carried out considering the following aspects: market attractiveness, current & future market trends, market share analysis, SWOT analysis of the companies and customer analytics.
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